Preparation of an Integrated Polarization Navigation Sensor via a Nanoimprint Photolithography Process

Based on the navigation strategy of insects utilizing polarized skylight, an integrated polarization sensor for autonomous is presented. The fabricated using proposed nanoimprint photolithography (NIPL) process by integrating a nanograting polarizer and image chip. NIPL uses UV-transparent variant template with nanoscale patterns microscale metal light-blocking layer. During process, part resist material pressed to fill into nanofeatures cured under UV exposure. At same time, other parts create micropatterns according Polymer-based templates can be used conformal contacts non-flat substrates excellent pattern transfer fidelity. suitable cross-scale micro–nano fabrication in wide applications. measurement error angle ±0.2°; thus, it will have good application prospect application.